Silicon sensor technology

All our products are based upon our patented silicon mass flow sensor technology. The sensor is produced just like a computer chip, using state of the art manufacturing technologies.

MEMS packaging

Our skilled engineers are masters in the art of MEMS packaging. Unlike other micromachined silicon mass flow sensors, and thick film based flow sensors, our sensors withstand the harshest environmental conditions.

Features and benefits:

• High dyamic range (>1:1000)
• High sensitivity and resolution
• High reproducibility and stability over time
• Bi-directional use: the sensor can measure in two directions
• Coated or packaged to meet the harshest industrial environments

Measurement principle

In 1974, Anton van Putten has pioneered the development of MEMS flow sensor technology by implementing world's first thermal mass flow sensor on a silicon substrate.

The animation on the right shows two original slides from early experiments. The air flow cools down the hot wire Wheatstonebridge. This results in a change of resistance, which can be measured amplified.

State of the art calibration facilities

We use the most advanced flow calibration systems in the world. Our pressurized calibration systems (patented) can generate flows from a few litres per minute up to hurricane level flows of about twenty thousand litres per minute. Read more about our calibration facilities.